Foreign media: Bipartisan U.S. lawmakers have introduced a draft bill called the MATCH Act, aiming to further restrict the export of semiconductor manufacturing equipment to China, targeting immersion deep ultraviolet lithography machines produced by companies such as Netherlands' ASML and Japan's Nikon, and prohibiting the sale or repair of related equipment to major Chinese chipmakers including SMIC, Huahong Semiconductor, Huawei, Yangtze Memory Technologies Corp (YMTC), and ChangXin Memory Technologies Inc.
This move is intended to safeguard America's leading position in the field of artificial intelligence by preventing China from acquiring chip-making tools it cannot manufacture independently. Existing regulations already restrict the export of ASML's most advanced equipment to China, but older models of deep ultraviolet lithography machines can still be sold there. The new legislation would completely ban such sales. In 2025, China accounted for 33% of ASML’s sales, but this is expected to drop to 20% this year.
Original article: toutiao.com/article/1861467916608521/
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