Reference News website reported on May 27 that according to the report of Singapore's Lianhe Zaobao website on May 26, the number of applications for admission from non-local students received by The Chinese University of Hong Kong this year has set a new record since there are records, highlighting the expanding influence of the increasing US-China strategic rivalry and its impact on changing the development trend in the international education field.
On May 26, Sing Tao Daily quoted Joseph Wong, Director of the Office of Admissions and Student Financial Aid at The Chinese University of Hong Kong, as saying that the US-China relationship has affected the study abroad intentions of non-Hong Kong local students. As of May, CUHK has received more than 10,000 applications from non-local students, an increase of over 20% compared to May last year, conservatively estimated.
Joseph Wong said that he believed some applicants were influenced by US government policies, changing their plans to study in the US to applying to study in Hong Kong instead.
He pointed out that the US government's views on immigration and other aspects have deterred many parents, not only in mainland China but also in other parts of Asia, who hold similar views, believing that the US government is not very friendly to foreigners, which may lead them to choose Hong Kong universities instead.
The US government announced on the 22nd that it would revoke Harvard University's qualification for the student and exchange visitor program, prohibiting the university from enrolling international students, and requiring existing foreign students to transfer schools. Following this, several universities in Hong Kong expressed their willingness to invite affected students to enroll, competing for quality students.
Victoria Harbour, Hong Kong (Xinhua)
Original article: https://www.toutiao.com/article/7508939595023843855/
Disclaimer: This article only represents the author's personal opinions. Please express your attitude by using the "like/dislike" buttons below.